Compositional analysis of silicon oxide/silicon nitride thin films

Mechanical properties of sputtered silicon nitride thin films

Silicon nitride thin films were prepared by reactive sputtering from different sputtering targets and using a range of Ar/N2 sputtering gas mixtures. The hardness and the Young’s modulus of the samples were determined by nanoindentation measurements. Depending on the preparation parameters, the obtained values were in the ranges 8–23 and 100–210 GPa, respectively. Additionally, Fourier-transfor...

Photoluminsence and Optical Features of Hydrogented Silicon Nitride Thin Films

In this work we report room-temperature photoluminescence from as-deposited hydrogenated silicon nitride films due to silicon nanocrystals/structural disorder. A systematic study of fabrication parameters and post-heat treatment on the optical features has been done. Enhancement in optical constant on annealing is attributed to phase separation into c-Si and other phases.

Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks

With the continued miniaturization of devices in the semiconductor industry, atomic layer deposition (ALD) of silicon nitride thin films (SiNx) has attracted great interest due to the inherent benefits of this process compared to other silicon nitride thin film deposition techniques. These benefits include not only high conformality and atomic-scale thickness control, but also low deposition te...

Scandium Nitride Thin Films for Thermoelectrics

Mesoporous silicon oxynitride thin films.

Highly-ordered, pore-modified with amine groups, and glass-like mesoporous silicon oxynitride thin films were prepared by heat treatment of as-synthesized mesoporous silica thin films in a flowing ammonia environment at high temperatures.